In situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration

In situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration

A test element (TE) with an Ni-Fe point contact (PC) in planar configuration was fabricated using an etching process with a horizontal incidence ion beam. Successive in situ magnetoresistance (MR) measurements were carried out in the etching apparatus without breaking the vacuum to prevent the oxida...

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Veröffentlicht in:IEEE transactions on magnetics 2005-10, Vol.41 (10), p.2577-2579
1. Verfasser: Ohsawa, Y.
Format: Artikel
Sprache:eng
Schlagworte:
Anisotropic magnetoresistance
Cross-disciplinary physics: materials science
rheology
Electrical resistance measurement
Etching
Exact sciences and technology
Ion beams
Magnetic anisotropy
Magnetic domains
Magnetic field measurement
Magnetic films
Magnetism
magnetoresistance
Materials science
nanotechnology
nickel alloys
Other topics in materials science
Oxidation
Physics
Tellurium
Testing
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Beschreibung
Zusammenfassung:A test element (TE) with an Ni-Fe point contact (PC) in planar configuration was fabricated using an etching process with a horizontal incidence ion beam. Successive in situ magnetoresistance (MR) measurements were carried out in the etching apparatus without breaking the vacuum to prevent the oxidation of the PC. The TE showed the MR ratio around 12%, which was much larger than an anisotropic MR ratio of the film. It showed low (high) resistance with a magnetic field direction of parallel (antiparallel) magnetic geometry of the pinned and free area.
ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.2005.854665