40-mm(2) 3-V-only 50-MHz 64-Mb 2-b/cell CHE NOR flash memory
This paper presents a 3-V-only 64-Mb 4-level-cell (2-b/cell) NOR-type channel-hot-electron (CHE) programmed flash memory fabricated in 0.18-mum shallow-trench isolation CMOS technology. The device (die size 40 mm(2)) is organized in 64 1-Mb sectors. Hierarchical column and row decoding ensures compl...
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Veröffentlicht in: | IEEE journal of solid-state circuits 2000-11, Vol.35 (11), p.1655-1667 |
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Hauptverfasser: | , , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper presents a 3-V-only 64-Mb 4-level-cell (2-b/cell) NOR-type channel-hot-electron (CHE) programmed flash memory fabricated in 0.18-mum shallow-trench isolation CMOS technology. The device (die size 40 mm(2)) is organized in 64 1-Mb sectors. Hierarchical column and row decoding ensures complete isolation between different sectors during any operation, thereby increasing device reliability while still providing layout area optimization. Staircase gate-voltage programming is used to achieve narrow threshold-voltage distributions. The same program throughput as for bilevel CHE-programmed memories is obtained, thanks to parallel programming. A mixed balanced/unbalanced sensing approach allows efficient use of the available threshold window. Asynchronous (130-ns access time) and burst-mode (up to 50-MHz data rate) reading is possible. Both column and row redundancy is provided to ensure extended failure coverage. Error correction code techniques, correcting 1 failed over 32 data cells, are also integrated |
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ISSN: | 0018-9200 |
DOI: | 10.1109/4.881212 |