40-mm(2) 3-V-only 50-MHz 64-Mb 2-b/cell CHE NOR flash memory

This paper presents a 3-V-only 64-Mb 4-level-cell (2-b/cell) NOR-type channel-hot-electron (CHE) programmed flash memory fabricated in 0.18-mum shallow-trench isolation CMOS technology. The device (die size 40 mm(2)) is organized in 64 1-Mb sectors. Hierarchical column and row decoding ensures compl...

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Veröffentlicht in:IEEE journal of solid-state circuits 2000-11, Vol.35 (11), p.1655-1667
Hauptverfasser: Campardo, G, Micheloni, R, Commodaro, S, Yero, E, Zammattio, M, Mognoni, S, Sacco, A, Picca, M, Manstretta, A, Scotti, M, Motta, I, Golla, C, Pierin, A, Bez, R, Grossi, A, Modelli, A, Visconti, A, Khouri, O, Torelli, G
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Sprache:eng
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Zusammenfassung:This paper presents a 3-V-only 64-Mb 4-level-cell (2-b/cell) NOR-type channel-hot-electron (CHE) programmed flash memory fabricated in 0.18-mum shallow-trench isolation CMOS technology. The device (die size 40 mm(2)) is organized in 64 1-Mb sectors. Hierarchical column and row decoding ensures complete isolation between different sectors during any operation, thereby increasing device reliability while still providing layout area optimization. Staircase gate-voltage programming is used to achieve narrow threshold-voltage distributions. The same program throughput as for bilevel CHE-programmed memories is obtained, thanks to parallel programming. A mixed balanced/unbalanced sensing approach allows efficient use of the available threshold window. Asynchronous (130-ns access time) and burst-mode (up to 50-MHz data rate) reading is possible. Both column and row redundancy is provided to ensure extended failure coverage. Error correction code techniques, correcting 1 failed over 32 data cells, are also integrated
ISSN:0018-9200
DOI:10.1109/4.881212