Germanium photopatterning via poly(cyclogermapentene)s

A series of air-stable poly(cyclogermapentene)s were prepared the dehydrocoupling of 1,1-dihydrocyclogermapentene monomers. Exposure of the resulting polygermanes to UV light led to elimination of organobutadiene from the polymer side chains and deposition of germanium metal. Overall, this study int...

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Veröffentlicht in:Chemical communications (Cambridge, England) England), 2023-06, Vol.59 (45), p.6849-6852
Hauptverfasser: Medroa Del Pino, William, Ferero Pico, Andres A, Gupta, Manisha, Rivard, Eric
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creator Medroa Del Pino, William
Ferero Pico, Andres A
Gupta, Manisha
Rivard, Eric
description A series of air-stable poly(cyclogermapentene)s were prepared the dehydrocoupling of 1,1-dihydrocyclogermapentene monomers. Exposure of the resulting polygermanes to UV light led to elimination of organobutadiene from the polymer side chains and deposition of germanium metal. Overall, this study introduces a mild way to obtain patterns of semiconducting Ge for optoelectronic applications.
doi_str_mv 10.1039/d3cc01708g
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source Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection
subjects Germanium
Optoelectronics
Ultraviolet radiation
title Germanium photopatterning via poly(cyclogermapentene)s
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