Correlations between processing parameters and microstructure for YSZ films produced by plasma spray technique

Yttria-stabilized zirconia (YSZ) powders have been used to prepare plasma-sprayed zirconia films on various substrates employing non-equilibrium plasma spraying technology at atmospheric pressure. The properties of obtained YSZ films 20–60 μm in thickness are presented. This paper shows how the spra...

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Veröffentlicht in:Journal of the European Ceramic Society 2004, Vol.24 (6), p.1095-1099
Hauptverfasser: Brinkiene, Kristina, Kezelis, Romualdas
Format: Artikel
Sprache:eng
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Zusammenfassung:Yttria-stabilized zirconia (YSZ) powders have been used to prepare plasma-sprayed zirconia films on various substrates employing non-equilibrium plasma spraying technology at atmospheric pressure. The properties of obtained YSZ films 20–60 μm in thickness are presented. This paper shows how the spray regime affects the microstructure of obtained YSZ films by using different shapes of plasma torch-Laval-like contour and cylinder. The influence of process parameters on formation and morphology of as-sprayed films has been investigated using the data of microstructural analysis. The results indicate plasma torch shape and started powder characteristics to be the most important parameters influencing the film microstructure.
ISSN:0955-2219
1873-619X
DOI:10.1016/S0955-2219(03)00389-3