High-performance Ge/Si electro-absorption optical modulator up to 85°C and its highly efficient photodetector operation

We studied a high-speed Ge/Si electro-absorption optical modulator (EAM) evanescently coupled with a Si waveguide of a lateral p-n junction for a high-bandwidth optical interconnect over a wide range of temperatures from 25 °C to 85 °C. We demonstrated 56 Gbps high-speed operation at temperatures up...

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Veröffentlicht in:Optics express 2023-03, Vol.31 (6), p.10732-10743
Hauptverfasser: Fujikata, Junichi, Noguchi, Masataka, Katamawari, Riku, Inaba, Kyosuke, Ono, Hideki, Shimura, Daisuke, Onawa, Yosuke, Yaegashi, Hiroki, Ishikawa, Yasuhiko
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Sprache:eng
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Zusammenfassung:We studied a high-speed Ge/Si electro-absorption optical modulator (EAM) evanescently coupled with a Si waveguide of a lateral p-n junction for a high-bandwidth optical interconnect over a wide range of temperatures from 25 °C to 85 °C. We demonstrated 56 Gbps high-speed operation at temperatures up to 85 °C. From the photoluminescence spectra, we confirmed that the bandgap energy dependence on temperature is relatively small, which is consistent with the shift in the operation wavelengths with increasing temperature for a Ge/Si EAM. We also demonstrated that the same device operates as a high-speed and high-efficiency Ge photodetector with the Franz-Keldysh (F-K) and avalanche-multiplication effects. These results demonstrate that the Ge/Si stacked structure is promising for both high-performance optical modulators and photodetectors integrated on Si platforms.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.484380