Mixed stitching interferometry with correction from one-dimensional profile measurements for high-precision X-ray mirrors

This work presents a mixed stitching interferometry method with correction from one-dimensional profile measurements. This method can correct the error of stitching angles among different subapertures using the relatively accurate one-dimensional profiles of the mirror, e.g., provided by the contact...

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Veröffentlicht in:Optics express 2023-05, Vol.31 (10), p.16330-16347
Hauptverfasser: Wu, Qiaoyu, Huang, Qiushi, Yu, Jun, Zhu, Yifan, Gu, Weichen, Sheng, Pengfeng, He, Yumei, Luo, Hongxin, Zhang, Zhong, Wang, Zhanshan
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Sprache:eng
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Zusammenfassung:This work presents a mixed stitching interferometry method with correction from one-dimensional profile measurements. This method can correct the error of stitching angles among different subapertures using the relatively accurate one-dimensional profiles of the mirror, e.g., provided by the contact profilometer. The measurement accuracy is simulated and analyzed. The repeatability error is decreased by averaging multiple measurements of the one-dimensional profile and using multiple profiles at different measurement positions. Finally, the measurement result of an elliptical mirror is presented and compared with the global algorithm-based stitching, and the error of the original profiles is reduced to one-third. This result shows that this method can effectively suppress the accumulation of stitching angle errors in classic global algorithm-based stitching. The accuracy of this method can be further improved by using high-precision one-dimensional profile measurements such as the nanometer optical component measuring machine (NOM).
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.486829