Isothermal Heteroepitaxy of Ge1–x Sn x Structures for Electronic and Photonic Applications
Epitaxy of semiconductor-based quantum well structures is a challenging task since it requires precise control of the deposition at the submonolayer scale. In the case of Ge1–x Sn x alloys, the growth is particularly demanding since the lattice strain and the process temperature greatly impact the c...
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Veröffentlicht in: | ACS applied electronic materials 2023-04, Vol.5 (4), p.2268-2275 |
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Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Epitaxy of semiconductor-based quantum well structures is a challenging task since it requires precise control of the deposition at the submonolayer scale. In the case of Ge1–x Sn x alloys, the growth is particularly demanding since the lattice strain and the process temperature greatly impact the composition of the epitaxial layers. In this paper, the realization of high-quality pseudomorphic Ge1–x Sn x layers with Sn content ranging from 6 at. % up to 15 at. % using isothermal processes in an industry-compatible reduced-pressure chemical vapor deposition reactor is presented. The epitaxy of Ge1–x Sn x layers has been optimized for a standard process offering a high Sn concentration at a large process window. By varying the N2 carrier gas flow, isothermal heterostructure designs suitable for quantum transport and spintronic devices are obtained. |
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ISSN: | 2637-6113 2637-6113 |
DOI: | 10.1021/acsaelm.3c00112 |