THERMAL DESORPTION BEHAVIOR OF AlF3 FORMED ON Al2O3

THERMAL DESORPTION BEHAVIOR OF AlF3 FORMED ON Al2O3

Thermal desorption behaviors of the AlF3 layer formed on Al2O3 in the sample temperature range from Ts = 300 to 930 K have been studied using molecular beam mass spectrometry combined with a TOF technique. F atoms were detected as the desorbed species at sample temperatures of Ts = 625 to 850 K and...

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Veröffentlicht in:Jpn.J.Appl.Phys ,Part 2. Vol. 42, no. 6B, pp. L680-L682. 2003 Part 2. Vol. 42, no. 6B, pp. L680-L682. 2003, 2003-06, Vol.42 (6B), p.L680-L682
Hauptverfasser: Watanabe, M, Iida, T, Akiyama, K, Ishikawa, T, Sakai, H, Sawabe, K, Shobatake, K
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Sprache:eng
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Zusammenfassung:Thermal desorption behaviors of the AlF3 layer formed on Al2O3 in the sample temperature range from Ts = 300 to 930 K have been studied using molecular beam mass spectrometry combined with a TOF technique. F atoms were detected as the desorbed species at sample temperatures of Ts = 625 to 850 K and the intensity peaked at Ts = 750 K. AlF2 species whose translational temperature Ttr is approximately 100 K lower than Ts were also detected as desorbed species above Ts = 850 K and the intensity increased exponentially as Ts was raised. Based on these results, the desorption behavior of AlF3 species is discussed. 14 refs.
ISSN:0021-4922
DOI:10.1143/jjap.42.L680