On modeling crosstalk faults

Traditionally, digital testing of integrated semiconductor circuits has focused on manufacturing defects. There is another class of failures that happens due to circuit marginalities. Circuit-marginality failures are on the rise due to shrinking process geometries, diminishing supply voltage, sharpe...

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Veröffentlicht in:IEEE transactions on computer-aided design of integrated circuits and systems 2005-12, Vol.24 (12), p.1909-1915
Hauptverfasser: Kundu, S., Zachariah, S.T., Yi-Shing Chang, Tirumurti, C.
Format: Artikel
Sprache:eng
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Zusammenfassung:Traditionally, digital testing of integrated semiconductor circuits has focused on manufacturing defects. There is another class of failures that happens due to circuit marginalities. Circuit-marginality failures are on the rise due to shrinking process geometries, diminishing supply voltage, sharper signal-transition rates, and aggressive styles in circuit design. There are many different marginality issues that may render a circuit nonoperational. Capacitive cross coupling between interconnects is known to be a leading cause for marginality-related failures. In this paper, we present novel techniques to model and prioritize capacitive crosstalk faults. Experimental results are provided to show effectiveness of the proposed modeling technique on large industrial designs.
ISSN:0278-0070
1937-4151
DOI:10.1109/TCAD.2005.852670