Synthesis and optical characterization of erbium-doped III-N double heterostructures

We report on the first successful synthesis of Er-doped III-N double heterostructures (DHs) grown on sapphire substrates. AlGaN layers, with an Al concentration of ∼12%, were prepared by metalorganic chemical vapor deposition and Er-doped GaN layers by molecular beam epitaxy. The Er concentration wa...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2003-12, Vol.105 (1), p.118-121
Hauptverfasser: Zavada, J.M., Lin, J.Y., Jiang, H.X., Chow, P., Hertog, B., Hömmerich, U., Nyein, Ei Ei, Jenkinson, H.A.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We report on the first successful synthesis of Er-doped III-N double heterostructures (DHs) grown on sapphire substrates. AlGaN layers, with an Al concentration of ∼12%, were prepared by metalorganic chemical vapor deposition and Er-doped GaN layers by molecular beam epitaxy. The Er concentration was estimated to be ∼10 18 cm −3. GaN:Er/AlGaN single heterostructures (SHs) and AlGaN/GaN:Er/AlGaN DHs were studied using photoluminescence (PL) spectroscopy. Emission lines characteristic of the GaN:Er system (green: 537 and 558 nm, infrared: 1530 nm) were observed in all samples. With UV excitation, the infrared PL from the DHs showed a marked improvement compared to the SHs. The PL intensity increased and the spectra showed less defect-related emission. The enhanced PL properties may be due to more effective confinement of electron–hole pairs in the quantum well region.
ISSN:0921-5107
1873-4944
DOI:10.1016/j.mseb.2003.08.028