Self-Tailored One-Dimensional ZnO Nanodot Arrays Formed by Metalorganic Chemical Vapor Deposition

1-D ZnO nanodot arrays have been realized by MOCVD on SiO2 substrates patterned by focused ion beam. Especially for the lines with the depth of 5 nm and the length of 0.7, 1.3 or 1.7 mu m, one, two or three nanodots, resp., of fairly uniform size 6-nm height and 80-nm width are symmetrically accommodated in a line. These phenomena are translated as self-tailoring of ZnO nanodots, i.e., where the nanodots will be is predetermined before the growth and is arbitrarily controlled by the nanopatterns. This can be a promising technique to build nanostructure blocks for nanoscale device applications. 15 refs.