A novel high temperature pressure sensor on the basis of SOI layers

The principle of silicon-on-insulator (SOI) and low pressure chemical vapour deposited (LPCVD) to make the piezoresisitive pressure gauge is developed. A novel structure of the sensors for harsh environment is designed. In particular, the high temperature pressure sensors were used in: automotive in...

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Veröffentlicht in:Sensors and actuators. A, Physical Physical, 2003-11, Vol.108 (1), p.108-111
Hauptverfasser: Yulong, Zhao, Libo, Zhao, Zhuangde, Jiang
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container_title Sensors and actuators. A, Physical
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creator Yulong, Zhao
Libo, Zhao
Zhuangde, Jiang
description The principle of silicon-on-insulator (SOI) and low pressure chemical vapour deposited (LPCVD) to make the piezoresisitive pressure gauge is developed. A novel structure of the sensors for harsh environment is designed. In particular, the high temperature pressure sensors were used in: automotive industry, aviation engineering, as well as in oil fields, industrial measurement and control systems. The sensor could be used in 200 °C environment, and could endure the impact of instances high temperature (about 1000, and less than 0.5 s) because of it’s mechanical structure of cantilever bonded with SOI strain gauge. The test data of the sensor is obtained, and the result is satisfied.
doi_str_mv 10.1016/j.sna.2003.07.011
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27933233</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0924424703004102</els_id><sourcerecordid>27933233</sourcerecordid><originalsourceid>FETCH-LOGICAL-c356t-4faad6454b5e8ff51e872a31cf19045ac59f81be54077807c1bc1f4a857862b83</originalsourceid><addsrcrecordid>eNp9kD1PwzAQhi0EEqXwA9i8wJZgx3aciKmq-KhUqQMwW457pq7SuPjSSv33pGolNqa74Xnf0z2E3HOWc8bLp3WOnc0LxkTOdM44vyAjXmmRCVbWl2TE6kJmspD6mtwgrtkACq1HZDqhXdxDS1fhe0V72Gwh2X6XgG4TIB4XhA5jorGj_QpoYzEgjZ5-LGa0tQdIeEuuvG0R7s5zTL5eXz6n79l88TabTuaZE6rsM-mtXZZSyUZB5b3iUOnCCu48r5lU1qnaV7wBJZnWFdOON457aSulq7JoKjEmj6febYo_O8DebAI6aFvbQdyhKXQtRCHEAPIT6FJETODNNoWNTQfDmTnqMmsz6DJHXYZpM-gaMg_ncovOtj7ZzgX8CypR1pyzgXs-cTB8ug-QDLoAnYNlSOB6s4zhnyu_H7F-pQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27933233</pqid></control><display><type>article</type><title>A novel high temperature pressure sensor on the basis of SOI layers</title><source>Elsevier ScienceDirect Journals</source><creator>Yulong, Zhao ; Libo, Zhao ; Zhuangde, Jiang</creator><creatorcontrib>Yulong, Zhao ; Libo, Zhao ; Zhuangde, Jiang</creatorcontrib><description>The principle of silicon-on-insulator (SOI) and low pressure chemical vapour deposited (LPCVD) to make the piezoresisitive pressure gauge is developed. A novel structure of the sensors for harsh environment is designed. In particular, the high temperature pressure sensors were used in: automotive industry, aviation engineering, as well as in oil fields, industrial measurement and control systems. The sensor could be used in 200 °C environment, and could endure the impact of instances high temperature (about 1000, and less than 0.5 s) because of it’s mechanical structure of cantilever bonded with SOI strain gauge. The test data of the sensor is obtained, and the result is satisfied.</description><identifier>ISSN: 0924-4247</identifier><identifier>EISSN: 1873-3069</identifier><identifier>DOI: 10.1016/j.sna.2003.07.011</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; General equipment and techniques ; Harsh environment ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Micro- and nanoelectromechanical devices (mems/nems) ; Physics ; Pressure sensor ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing ; SOI strain gauge</subject><ispartof>Sensors and actuators. A, Physical, 2003-11, Vol.108 (1), p.108-111</ispartof><rights>2003 Elsevier B.V.</rights><rights>2004 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c356t-4faad6454b5e8ff51e872a31cf19045ac59f81be54077807c1bc1f4a857862b83</citedby><cites>FETCH-LOGICAL-c356t-4faad6454b5e8ff51e872a31cf19045ac59f81be54077807c1bc1f4a857862b83</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.sna.2003.07.011$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3536,23910,23911,25119,27903,27904,45974</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=15369110$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Yulong, Zhao</creatorcontrib><creatorcontrib>Libo, Zhao</creatorcontrib><creatorcontrib>Zhuangde, Jiang</creatorcontrib><title>A novel high temperature pressure sensor on the basis of SOI layers</title><title>Sensors and actuators. A, Physical</title><description>The principle of silicon-on-insulator (SOI) and low pressure chemical vapour deposited (LPCVD) to make the piezoresisitive pressure gauge is developed. A novel structure of the sensors for harsh environment is designed. In particular, the high temperature pressure sensors were used in: automotive industry, aviation engineering, as well as in oil fields, industrial measurement and control systems. The sensor could be used in 200 °C environment, and could endure the impact of instances high temperature (about 1000, and less than 0.5 s) because of it’s mechanical structure of cantilever bonded with SOI strain gauge. The test data of the sensor is obtained, and the result is satisfied.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>General equipment and techniques</subject><subject>Harsh environment</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Micro- and nanoelectromechanical devices (mems/nems)</subject><subject>Physics</subject><subject>Pressure sensor</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing</subject><subject>SOI strain gauge</subject><issn>0924-4247</issn><issn>1873-3069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNp9kD1PwzAQhi0EEqXwA9i8wJZgx3aciKmq-KhUqQMwW457pq7SuPjSSv33pGolNqa74Xnf0z2E3HOWc8bLp3WOnc0LxkTOdM44vyAjXmmRCVbWl2TE6kJmspD6mtwgrtkACq1HZDqhXdxDS1fhe0V72Gwh2X6XgG4TIB4XhA5jorGj_QpoYzEgjZ5-LGa0tQdIeEuuvG0R7s5zTL5eXz6n79l88TabTuaZE6rsM-mtXZZSyUZB5b3iUOnCCu48r5lU1qnaV7wBJZnWFdOON457aSulq7JoKjEmj6febYo_O8DebAI6aFvbQdyhKXQtRCHEAPIT6FJETODNNoWNTQfDmTnqMmsz6DJHXYZpM-gaMg_ncovOtj7ZzgX8CypR1pyzgXs-cTB8ug-QDLoAnYNlSOB6s4zhnyu_H7F-pQ</recordid><startdate>20031115</startdate><enddate>20031115</enddate><creator>Yulong, Zhao</creator><creator>Libo, Zhao</creator><creator>Zhuangde, Jiang</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope></search><sort><creationdate>20031115</creationdate><title>A novel high temperature pressure sensor on the basis of SOI layers</title><author>Yulong, Zhao ; Libo, Zhao ; Zhuangde, Jiang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c356t-4faad6454b5e8ff51e872a31cf19045ac59f81be54077807c1bc1f4a857862b83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>General equipment and techniques</topic><topic>Harsh environment</topic><topic>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</topic><topic>Micro- and nanoelectromechanical devices (mems/nems)</topic><topic>Physics</topic><topic>Pressure sensor</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing</topic><topic>SOI strain gauge</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yulong, Zhao</creatorcontrib><creatorcontrib>Libo, Zhao</creatorcontrib><creatorcontrib>Zhuangde, Jiang</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><jtitle>Sensors and actuators. A, Physical</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yulong, Zhao</au><au>Libo, Zhao</au><au>Zhuangde, Jiang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A novel high temperature pressure sensor on the basis of SOI layers</atitle><jtitle>Sensors and actuators. A, Physical</jtitle><date>2003-11-15</date><risdate>2003</risdate><volume>108</volume><issue>1</issue><spage>108</spage><epage>111</epage><pages>108-111</pages><issn>0924-4247</issn><eissn>1873-3069</eissn><abstract>The principle of silicon-on-insulator (SOI) and low pressure chemical vapour deposited (LPCVD) to make the piezoresisitive pressure gauge is developed. A novel structure of the sensors for harsh environment is designed. In particular, the high temperature pressure sensors were used in: automotive industry, aviation engineering, as well as in oil fields, industrial measurement and control systems. The sensor could be used in 200 °C environment, and could endure the impact of instances high temperature (about 1000, and less than 0.5 s) because of it’s mechanical structure of cantilever bonded with SOI strain gauge. The test data of the sensor is obtained, and the result is satisfied.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.sna.2003.07.011</doi><tpages>4</tpages></addata></record>
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subjects Applied sciences
Electronics
Exact sciences and technology
General equipment and techniques
Harsh environment
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Micro- and nanoelectromechanical devices (mems/nems)
Physics
Pressure sensor
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Sensors (chemical, optical, electrical, movement, gas, etc.)
remote sensing
SOI strain gauge
title A novel high temperature pressure sensor on the basis of SOI layers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T06%3A04%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20novel%20high%20temperature%20pressure%20sensor%20on%20the%20basis%20of%20SOI%20layers&rft.jtitle=Sensors%20and%20actuators.%20A,%20Physical&rft.au=Yulong,%20Zhao&rft.date=2003-11-15&rft.volume=108&rft.issue=1&rft.spage=108&rft.epage=111&rft.pages=108-111&rft.issn=0924-4247&rft.eissn=1873-3069&rft_id=info:doi/10.1016/j.sna.2003.07.011&rft_dat=%3Cproquest_cross%3E27933233%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27933233&rft_id=info:pmid/&rft_els_id=S0924424703004102&rfr_iscdi=true