Growth characteristics of carbon nanotubes via aluminum nanopore template on Si substrate using PECVD

Well ordered nano sized pore was fabricated on Si substrate using anodic oxidation method. Carbon nanotubes (CNTs) were grown on the well-ordered anodic aluminum oxide (AAO) template formed on Si substrate using plasma enhanced chemical vapor deposition with acetylene (C 2H 2). Without catalytic met...

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Veröffentlicht in:	Thin solid films 2003-07, Vol.435 (1), p.312-317
Hauptverfasser:	Kim, Mun Ja, Choi, Jong Hyung, Park, Jong Bae, Kim, Seong Kyu, Yoo, Ji-Beom, Park, Chong-Yun
Format:	Artikel
Sprache:	eng
Schlagworte:	AAO/Si Anodic aluminum oxide (AAO) Carbon nanotubes Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Nanoscale materials and structures: fabrication and characterization Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma enhanced chemical vapor deposition
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Beschreibung
Zusammenfassung:	Well ordered nano sized pore was fabricated on Si substrate using anodic oxidation method. Carbon nanotubes (CNTs) were grown on the well-ordered anodic aluminum oxide (AAO) template formed on Si substrate using plasma enhanced chemical vapor deposition with acetylene (C 2H 2). Without catalytic metal on the bottom of the AAO template, CNTs were grown on the top and within a nano-channel of the alumina template at 550 °C. The effect of process parameters such as plasma intensity, temperature and gas composition on the morphology of CNTs was investigated.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(03)00339-0