Ferroelectricity in layered bismuth oxide down to 1 nanometer

Atomic-scale ferroelectrics are of great interest for high-density electronics, particularly field-effect transistors, low-power logic, and nonvolatile memories. We devised a film with a layered structure of bismuth oxide that can stabilize the ferroelectric state down to 1 nanometer through samariu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Science (American Association for the Advancement of Science) 2023-03, Vol.379 (6638), p.1218-1224
Hauptverfasser: Yang, Qianqian, Hu, Jingcong, Fang, Yue-Wen, Jia, Yueyang, Yang, Rui, Deng, Shiqing, Lu, Yue, Dieguez, Oswaldo, Fan, Longlong, Zheng, Dongxing, Zhang, Xixiang, Dong, Yongqi, Luo, Zhenlin, Wang, Zhen, Wang, Huanhua, Sui, Manling, Xing, Xianran, Chen, Jun, Tian, Jianjun, Zhang, Linxing
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Atomic-scale ferroelectrics are of great interest for high-density electronics, particularly field-effect transistors, low-power logic, and nonvolatile memories. We devised a film with a layered structure of bismuth oxide that can stabilize the ferroelectric state down to 1 nanometer through samarium bondage. This film can be grown on a variety of substrates with a cost-effective chemical solution deposition. We observed a standard ferroelectric hysteresis loop down to a thickness of ~1 nanometer. The thin films with thicknesses that range from 1 to 4.56 nanometers possess a relatively large remanent polarization from 17 to 50 microcoulombs per square centimeter. We verified the structure with first-principles calculations, which also pointed to the material being a lone pair-driven ferroelectric material. The structure design of the ultrathin ferroelectric films has great potential for the manufacturing of atomic-scale electronic devices.
ISSN:0036-8075
1095-9203
DOI:10.1126/science.abm5134