Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation
Films of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) were exposed to radiation from 6.7 × 10 4 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut...
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| Veröffentlicht in: | Polymer degradation and stability 2003-03, Vol.79 (3), p.399-404 |
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| creator | Chen, J.X. Tracy, D. Zheng, S. Xiaolu, L. Brown, S. VanDerveer, W. Entenberg, A. Vukanovic, V. Takacs, G.A. Egitto, F.D. Matienzo, L.J. Emmi, F. |
| description | Films of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) were exposed to radiation from 6.7 × 10
4 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut-off wavelengths to vary the vacuum ultraviolet (VUV) radiation that modified the fluoropolymer surface. With arc currents of 7 A and sample temperatures up to 110 °C, the photoetch rate of FEP was ca. 50% higher than for PTFE. Consistent with results for PTFE, treated FEP showed the following: (1) contact angles that started to decrease in the wavelength region between 173 and 160 nm and continued to decrease with shorter wavelengths; (2) surface roughening; (3) defluorination of the surface with a slight increase in the atomic%C and formation of C–C bonds in the top 3–5 nm of the surface as detected by XPS analysis; and (4) incorporation of oxygen, presumably from reaction with oxygen in air. |
| doi_str_mv | 10.1016/S0141-3910(02)00339-7 |
| format | Article |
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4 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut-off wavelengths to vary the vacuum ultraviolet (VUV) radiation that modified the fluoropolymer surface. With arc currents of 7 A and sample temperatures up to 110 °C, the photoetch rate of FEP was ca. 50% higher than for PTFE. Consistent with results for PTFE, treated FEP showed the following: (1) contact angles that started to decrease in the wavelength region between 173 and 160 nm and continued to decrease with shorter wavelengths; (2) surface roughening; (3) defluorination of the surface with a slight increase in the atomic%C and formation of C–C bonds in the top 3–5 nm of the surface as detected by XPS analysis; and (4) incorporation of oxygen, presumably from reaction with oxygen in air.</description><identifier>ISSN: 0141-3910</identifier><identifier>EISSN: 1873-2321</identifier><identifier>DOI: 10.1016/S0141-3910(02)00339-7</identifier><identifier>CODEN: PDSTDW</identifier><language>eng</language><publisher>Oxford: Elsevier Ltd</publisher><subject>Applied sciences ; Crosslinking and degradation ; Exact sciences and technology ; FEP ; Photodegradation ; Physicochemistry of polymers ; Polymers and radiations ; Radiation ; Surface modification ; VUV</subject><ispartof>Polymer degradation and stability, 2003-03, Vol.79 (3), p.399-404</ispartof><rights>2002 Elsevier Science Ltd</rights><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c368t-16dff4478553a5d854a446ef4d0a63d263d6f3514767ec66ae6490348495d493</citedby><cites>FETCH-LOGICAL-c368t-16dff4478553a5d854a446ef4d0a63d263d6f3514767ec66ae6490348495d493</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0141-3910(02)00339-7$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14478731$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Chen, J.X.</creatorcontrib><creatorcontrib>Tracy, D.</creatorcontrib><creatorcontrib>Zheng, S.</creatorcontrib><creatorcontrib>Xiaolu, L.</creatorcontrib><creatorcontrib>Brown, S.</creatorcontrib><creatorcontrib>VanDerveer, W.</creatorcontrib><creatorcontrib>Entenberg, A.</creatorcontrib><creatorcontrib>Vukanovic, V.</creatorcontrib><creatorcontrib>Takacs, G.A.</creatorcontrib><creatorcontrib>Egitto, F.D.</creatorcontrib><creatorcontrib>Matienzo, L.J.</creatorcontrib><creatorcontrib>Emmi, F.</creatorcontrib><title>Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation</title><title>Polymer degradation and stability</title><description>Films of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) were exposed to radiation from 6.7 × 10
4 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut-off wavelengths to vary the vacuum ultraviolet (VUV) radiation that modified the fluoropolymer surface. With arc currents of 7 A and sample temperatures up to 110 °C, the photoetch rate of FEP was ca. 50% higher than for PTFE. Consistent with results for PTFE, treated FEP showed the following: (1) contact angles that started to decrease in the wavelength region between 173 and 160 nm and continued to decrease with shorter wavelengths; (2) surface roughening; (3) defluorination of the surface with a slight increase in the atomic%C and formation of C–C bonds in the top 3–5 nm of the surface as detected by XPS analysis; and (4) incorporation of oxygen, presumably from reaction with oxygen in air.</description><subject>Applied sciences</subject><subject>Crosslinking and degradation</subject><subject>Exact sciences and technology</subject><subject>FEP</subject><subject>Photodegradation</subject><subject>Physicochemistry of polymers</subject><subject>Polymers and radiations</subject><subject>Radiation</subject><subject>Surface modification</subject><subject>VUV</subject><issn>0141-3910</issn><issn>1873-2321</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqFkE1r3DAQhkVooNukP6GgS0NycCJZsmSfSgnNBwRSSNKrENIoVrGtjSSnXfrno_Uu7bGDhoHheWdGL0KfKDmnhIqLB0I5rVhHySmpzwhhrKvkAVrRVrKqZjV9h1Z_kffoQ0o_SQne0BX6870POUA2vZ-esZ4sHoP1zhudfZhwcHgdhs1phhy1G-YQC9tvBpigMqHq4fe-uy5vaZ8tghEiTnN02kDCv3zu8as28zzipx84auuX6cfo0Okhwcd9PUKPV98eL2-qu_vr28uvd5Vhos0VFdY5zmXbNEw3tm245lyA45ZowWxdUjjWUC6FBCOEBsE7wnjLu8byjh2hk93YcuPLDCmr0ScDw6AnCHNStSy21LIuYLMDTQwpRXBqHf2o40ZRorZOq8VptbVRkVotTitZdJ_3C3QyenBRT8anf-Lt7ZLRwn3ZcVA---ohqmQ8TAasj2CyssH_Z9MbKN2U_A</recordid><startdate>20030301</startdate><enddate>20030301</enddate><creator>Chen, J.X.</creator><creator>Tracy, D.</creator><creator>Zheng, S.</creator><creator>Xiaolu, L.</creator><creator>Brown, S.</creator><creator>VanDerveer, W.</creator><creator>Entenberg, A.</creator><creator>Vukanovic, V.</creator><creator>Takacs, G.A.</creator><creator>Egitto, F.D.</creator><creator>Matienzo, L.J.</creator><creator>Emmi, F.</creator><general>Elsevier Ltd</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20030301</creationdate><title>Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation</title><author>Chen, J.X. ; Tracy, D. ; Zheng, S. ; Xiaolu, L. ; Brown, S. ; VanDerveer, W. ; Entenberg, A. ; Vukanovic, V. ; Takacs, G.A. ; Egitto, F.D. ; Matienzo, L.J. ; Emmi, F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-16dff4478553a5d854a446ef4d0a63d263d6f3514767ec66ae6490348495d493</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Applied sciences</topic><topic>Crosslinking and degradation</topic><topic>Exact sciences and technology</topic><topic>FEP</topic><topic>Photodegradation</topic><topic>Physicochemistry of polymers</topic><topic>Polymers and radiations</topic><topic>Radiation</topic><topic>Surface modification</topic><topic>VUV</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chen, J.X.</creatorcontrib><creatorcontrib>Tracy, D.</creatorcontrib><creatorcontrib>Zheng, S.</creatorcontrib><creatorcontrib>Xiaolu, L.</creatorcontrib><creatorcontrib>Brown, S.</creatorcontrib><creatorcontrib>VanDerveer, W.</creatorcontrib><creatorcontrib>Entenberg, A.</creatorcontrib><creatorcontrib>Vukanovic, V.</creatorcontrib><creatorcontrib>Takacs, G.A.</creatorcontrib><creatorcontrib>Egitto, F.D.</creatorcontrib><creatorcontrib>Matienzo, L.J.</creatorcontrib><creatorcontrib>Emmi, F.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Polymer degradation and stability</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chen, J.X.</au><au>Tracy, D.</au><au>Zheng, S.</au><au>Xiaolu, L.</au><au>Brown, S.</au><au>VanDerveer, W.</au><au>Entenberg, A.</au><au>Vukanovic, V.</au><au>Takacs, G.A.</au><au>Egitto, F.D.</au><au>Matienzo, L.J.</au><au>Emmi, F.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation</atitle><jtitle>Polymer degradation and stability</jtitle><date>2003-03-01</date><risdate>2003</risdate><volume>79</volume><issue>3</issue><spage>399</spage><epage>404</epage><pages>399-404</pages><issn>0141-3910</issn><eissn>1873-2321</eissn><coden>PDSTDW</coden><abstract>Films of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) were exposed to radiation from 6.7 × 10
4 Pa He and Ar dc arc plasmas that were made to rotate inside of a graphite tube by the application of an auxiliary magnetic field. The films were covered with optical filters having different cut-off wavelengths to vary the vacuum ultraviolet (VUV) radiation that modified the fluoropolymer surface. With arc currents of 7 A and sample temperatures up to 110 °C, the photoetch rate of FEP was ca. 50% higher than for PTFE. Consistent with results for PTFE, treated FEP showed the following: (1) contact angles that started to decrease in the wavelength region between 173 and 160 nm and continued to decrease with shorter wavelengths; (2) surface roughening; (3) defluorination of the surface with a slight increase in the atomic%C and formation of C–C bonds in the top 3–5 nm of the surface as detected by XPS analysis; and (4) incorporation of oxygen, presumably from reaction with oxygen in air.</abstract><cop>Oxford</cop><pub>Elsevier Ltd</pub><doi>10.1016/S0141-3910(02)00339-7</doi><tpages>6</tpages></addata></record> |
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| subjects | Applied sciences Crosslinking and degradation Exact sciences and technology FEP Photodegradation Physicochemistry of polymers Polymers and radiations Radiation Surface modification VUV |
| title | Photoetching and modification of poly(tetrafluoroethylene-co-hexafluoropropylene) polymer surfaces with vacuum UV radiation |
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