Facile construction of Z-scheme AgCl/Bi3TaO7 photocatalysts for effective removal of tetracycline under visible-light irradiation
A string of AgCl/Bi 3 TaO 7 two-component composite was synthesized by hydrothermal and deposition-precipitation process initially. The photocatalytic activities of mixed-phase AgCl/Bi 3 TaO 7 were evaluated toward the decomposition of tetracycline (TC). Among these as-prepared materials, AgCl/Bi 3...
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Veröffentlicht in: | Environmental science and pollution research international 2023-05, Vol.30 (22), p.62312-62324 |
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Sprache: | eng |
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Zusammenfassung: | A string of AgCl/Bi
3
TaO
7
two-component composite was synthesized by hydrothermal and deposition-precipitation process initially. The photocatalytic activities of mixed-phase AgCl/Bi
3
TaO
7
were evaluated toward the decomposition of tetracycline (TC). Among these as-prepared materials, AgCl/Bi
3
TaO
7
nanocomposites when the molar ratio of baked materials between AgCl and Bi
3
TaO
7
was 1:5 presented the optimal photocatalytic quantum efficiency for TC dissociation (86.82%) with visible-light exposure, which was 1.69 and 2.38 folders higher than that of single Bi
3
TaO
7
and AgCl, respectively. What is more, it illustrated that the photo-generated carriers were markedly isolated on account of the formation of heterojunction confirmed by EIS analysis. Meanwhile, radical trapping experiments implied that the photo-induced holes (h
+
), hydroxyl radical (·OH), and superoxide radical (·O
2
−
) were the major active species. The escalated photocatalytic activity could be ascribed to the unique construction of Z-scheme AgCl/Bi
3
TaO
7
heterojunction, which could expedite charge separation and transmission, cement light absorption capability and retain the strong redox ability of photo-generated electrons and holes. Our finding suggests that AgCl/Bi
3
TaO
7
nanocomposites possess great potential for photocatalytic oxidation of residual TC in the wastewater effluents and the reported strategy can contribute to the development of novel high-performance photocatalyst. |
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ISSN: | 1614-7499 0944-1344 1614-7499 |
DOI: | 10.1007/s11356-023-26323-8 |