Effect of the substrate material on diamond CVD coating properties

Diamond coatings were deposited onto different substrates (Cu, Si, WC–Co, Mo) by hot-filament chemical vapor deposition (CVD). Characterization of the obtained coatings was performed using scanning electron microscopy (SEM), X-ray diffraction (XRD) analysis, Raman spectroscopy and Fourier transform...

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Veröffentlicht in:	Materials chemistry and physics 2003-05, Vol.80 (2), p.529-536
Hauptverfasser:	Ristić, Gordana S., Bogdanov, Žarko D., Zec, Slavica, Romčević, Nebojša, Dohčević-Mitrović, Zorana, Miljanić, Šćepan S.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Diamond coating Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Substrate material effect Substrates: Mo, WC–Co, Si, Cu
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Beschreibung
Zusammenfassung:	Diamond coatings were deposited onto different substrates (Cu, Si, WC–Co, Mo) by hot-filament chemical vapor deposition (CVD). Characterization of the obtained coatings was performed using scanning electron microscopy (SEM), X-ray diffraction (XRD) analysis, Raman spectroscopy and Fourier transform infrared reflection (FTIR) spectroscopy. The results and observed differences are discussed from the aspect of the chemical nature of the substrate and its reactivity with a gaseous medium.
ISSN:	0254-0584 1879-3312
DOI:	10.1016/S0254-0584(03)00094-4