Fabrication of vanadium oxide thin film with high-temperature coefficient of resistance using V2O5/V/V2O5 multi-layers for uncooled microbolometers

Authors present a novel fabrication method for vanadium oxide thin films having good electrical properties. Through the formation of a sandwich structure of V2O5 (100 angstroms)/V (80 angstroms)/V2O5 (500 angstroms) by a conventional sputter method and post-annealing at 300 C in oxygen, a mixed phas...

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Veröffentlicht in:	Thin solid films 2003-02, Vol.425 (1-2), p.260-264
Hauptverfasser:	HAN, Yong-Hee, CHOI, In-Hoon, KANG, Ho-Kwan, PARK, Jong-Yeon, KIM, Kun-Tae, SHIN, Hyun-Joon, SUNG MOON
Format:	Artikel
Sprache:	eng
Schlagworte:	Bolometer infrared, submillimeter wave, microwave and radiowave receivers and detectors Bolometers infrared, submillimeter wave, microwave, and radiowave receivers and detectors Composition and phase identification Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Infrared, submillimeter wave, microwave and radiowave instruments, equipment and techniques Instruments, apparatus, components and techniques common to several branches of physics and astronomy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Zusammenfassung:	Authors present a novel fabrication method for vanadium oxide thin films having good electrical properties. Through the formation of a sandwich structure of V2O5 (100 angstroms)/V (80 angstroms)/V2O5 (500 angstroms) by a conventional sputter method and post-annealing at 300 C in oxygen, a mixed phase of VOx is formed. The results show that the mixed phase formed by this process has a high TCR of more than -2%/C and low resistivity of < 0.1 OHM cm at room temperature. 12 refs.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(02)01263-4