Patterning Quantum Dots via Photolithography: A Review

Pixelating patterns of red, green, and blue quantum dots (QDs) is a critical challenge for realizing high‐end displays with bright and vivid images for virtual, augmented, and mixed reality. Since QDs must be processed from a solution, their patterning process is completely different from the conventional techniques used in the organic light‐emitting diode and liquid crystal display industries. Although innovative QD patterning technologies are being developed, photopatterning based on the light‐induced chemical conversion of QD films is considered one of the most promising methods for forming micrometer‐scale QD patterns that satisfy the precision and fidelity required for commercialization. Moreover, the practical impact will be significant as it directly exploits mature photolithography technologies and facilities that are widely available in the semiconductor industry. This article reviews recent progress in the effort to form QD patterns via photolithography. The review begins with a general description of the photolithography process. Subsequently, different types of photolithographical methods applicable to QD patterning are introduced, followed by recent achievements using these methods in forming high‐resolution QD patterns. The paper also discusses prospects for future research directions. Quantum dots (QDs) are used as promising materials for next‐generation displays due to their excellent electrical/optical properties. Strategies for patterning QDs via photolithography (conventional photolithography, lift off process, and direct photolithography) are comprehensively reviewed. This review also discusses the prospects for patterned QDs in terms of their structural and physical properties.