Micro-Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron-Beam Lithography

This paper introduces an approach where the match of two different length scales, i.e., pattern from self‐assembly of block copolymer micelles ( 50 nm), allow the grouping of nanometer‐sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self‐assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres. The combination of two different length scales, patterning by self‐assembly of block copolymer micelles ( 50 nm), allows the grouping of nanometer‐sized gold clusters in very small numbers in even aperiodic patterns, and separation of these groups by length scales that are not accessible by self‐assembly alone. The grouping of Au nanoclusters in different geometries such as squares, rings (see Figure), or spheres is therefore possible.