LOW TEMPERATURE GROWTH OF EPITAXIAL La0.8Sr0.2MnO3 THIN FILMS BY AN EXCIMER-LASER-ASSISTED COATING PYROLYSIS PROCESS

The preparation of La0.8Sr0.2MnO3 (LSMO) films on a LaAlO3 (LAO) substrate has been investigated by an excimer-laser-assisted coating pyrolysis process (ELACPP) in the temperature range from 350 to 500 C. (00l) oriented LSMO films were obtained by ArF laser irradiation at 100 mJ/cm2 in the substrate temperature range from 400 to 500 C. The films prepared at 500 C on the LAO substrate were epitaxially grown based on XRD pole-figure measurements. The temperature dependence of the resistance of the LSMO film prepared at 400 C showed a semiconducting behavior. On the other hand, that prepared at 500 C showed a metallic behavior from 310 to 100 K and the absolute magnitude of the resistivity of the film at 300 K was 2.6 x 10-2 OHM cm. 18 refs.