Transpassive dissolution of Ni–Cr alloys in sulphate solutions—comparison between a model alloy and two industrial alloys

The application of a general model for the transpassive dissolution mechanism of binary Ni-based alloys to industrial alloys, Alloy 600 and Alloy C276, containing Ni, Cr, Fe and Mo, in 1 M sulphate solutions at pH 0 and 5 is described. A comparison of the electrochemical behaviour of these two alloy...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Electrochimica acta 2002-03, Vol.47 (11), p.1697-1712
Hauptverfasser: Bojinov, Martin, Fabricius, Gunilla, Kinnunen, Petri, Laitinen, Timo, Mäkelä, Kari, Saario, Timo, Sundholm, Göran, Yliniemi, Kirsi
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The application of a general model for the transpassive dissolution mechanism of binary Ni-based alloys to industrial alloys, Alloy 600 and Alloy C276, containing Ni, Cr, Fe and Mo, in 1 M sulphate solutions at pH 0 and 5 is described. A comparison of the electrochemical behaviour of these two alloys to a binary Ni–15%Cr alloy is also included. The techniques used were ring-disc voltammetry, impedance spectroscopy and resistance measurements. Soluble high-valency products were found to be released in a considerable amount from all the materials. The presence of Mo in Alloy C276 was found to increase the transpassive oxidation rate in comparison to alloys 600 and Ni–15%Cr at pH 0, but the same effect of Mo is not so well pronounced at pH 5. The mechanism of transpassive dissolution was found to be similar on every material at pH 0. At pH 5 the mechanism of the transpassive dissolution on Alloy C276 at high overpotentials is different from that at low overpotentials or from that at pH 0. This change is concluded to be due to the increased effect of adsorbed intermediates at the film/solution interface. The model was found to reproduce the steady state current and the impedance spectra satisfactorily.
ISSN:0013-4686
1873-3859
DOI:10.1016/S0013-4686(02)00018-X