The microstructure of ZrO sub 2 -Ni-Si sub 3 N sub 4 diffusion bonds

In this paper the results are presented of work dealing with the microstructure of ZrO sub(2)-Ni-Si sub(3)N sub(4) diffusion bonds. Joints were made at 1050 degree C with bonding times between 22.5 and 360 minutes. The interfacial structure was studied using optical microscopy, scanning electron microscopy and transmission electron microscopy. The element concentrations in the joint were determined by electron probe microanalysis. It was found that at the ZrO sub(2)-Ni interface no reactions take place, whereas at the Si sub(3)N sub(4)-Ni interface decomposition of Si sub(3)N sub(4) occurs, resulting in a solid solution of Si in Ni and porosity due to the recombination of N to N sub(2). copyright 2002 Kluwer Academic Publishers.