STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER

STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER

Authors analyzed the films chemically and physically. The phase shift and the transmittance of a transmissive film with a high O concentration increases and decreases, resp., with irradiation. This is because of an increase of Si-O-Zr bond structures. The phase shift and the transmittance of an abso...

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Veröffentlicht in:Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 7B, pp. 4561-4566. 2000 Part 1. Vol. 39, no. 7B, pp. 4561-4566. 2000, 2000, Vol.39 (7B), p.4561-4566
Hauptverfasser: Nakazawa, K, Matsuo, T, Onodera, T, Ogawa, T, Morimoto, H
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container_title Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 7B, pp. 4561-4566. 2000
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creator Nakazawa, K
Matsuo, T
Onodera, T
Ogawa, T
Morimoto, H
description Authors analyzed the films chemically and physically. The phase shift and the transmittance of a transmissive film with a high O concentration increases and decreases, resp., with irradiation. This is because of an increase of Si-O-Zr bond structures. The phase shift and the transmittance of an absorptive film with a low O concentration decreases and increases, resp., with irradiation because of photooxidation at the surface. The oxidation leads to the formation of Si-O-Zr and Si-O-Si bond structures in the films. Both films are stabilized by irradiation with a large irradiation energy. Authors interpret that both films are stabilized by the formation of Si-O-Zr bond structures, such as zircon, with saturation of O concentrations at the surface. 13 refs.
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