STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER

Authors analyzed the films chemically and physically. The phase shift and the transmittance of a transmissive film with a high O concentration increases and decreases, resp., with irradiation. This is because of an increase of Si-O-Zr bond structures. The phase shift and the transmittance of an absorptive film with a low O concentration decreases and increases, resp., with irradiation because of photooxidation at the surface. The oxidation leads to the formation of Si-O-Zr and Si-O-Si bond structures in the films. Both films are stabilized by irradiation with a large irradiation energy. Authors interpret that both films are stabilized by the formation of Si-O-Zr bond structures, such as zircon, with saturation of O concentrations at the surface. 13 refs.