Epitaxial electrodeposition of thallic oxide on single crystal gold

Epitaxial electrodeposition of thallic oxide on single crystal gold

Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on...

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Veröffentlicht in:Electrochimica acta 2000-06, Vol.45 (20), p.3233-3239
Hauptverfasser: Vertegel, Alexey A, Shumsky, Mark G, Switzer, Jay A
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Sprache:eng
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Electrodeposition
Epitaxy
Single crystal
Thallic oxide
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container_start_page 3233
container_title Electrochimica acta
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creator Vertegel, Alexey A
Shumsky, Mark G
Switzer, Jay A
description Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl 2O 3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.
doi_str_mv 10.1016/S0013-4686(00)00427-8
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27686385</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0013468600004278</els_id><sourcerecordid>27686385</sourcerecordid><originalsourceid>FETCH-LOGICAL-c338t-a8786b1e8c056da53a4907d98c8570da134f0f8b444e69bd0e376673df7b553d3</originalsourceid><addsrcrecordid>eNqFkE1LAzEURYMoWKs_QZiV6GL0pZlJ0pVIqR9QcKGuQyZ5UyPpZExGaf-9aStuXT143HPhHkLOKVxToPzmBYCysuKSXwJcAVQTUcoDMqJSsJLJenpIRn-RY3KS0gcACC5gRGbz3g167bQv0KMZYrDYh-QGF7oitMXwrr13pghrZ7HIv-S6pcfCxE0aMrQM3p6So1b7hGe_d0ze7uevs8dy8fzwNLtblIYxOZRaCskbitJAza2uma6mIOxUGlkLsJqyqoVWNlVVIZ82FpAJzgWzrWjqmlk2Jhf73j6Gzy9Mg1q5ZNB73WH4Smoi8r68NwfrfdDEkFLEVvXRrXTcKApqq0ztlKmtDwWgdsqUzNztnsO84tthVMk47AxaF7MbZYP7p-EHr9hzKg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27686385</pqid></control><display><type>article</type><title>Epitaxial electrodeposition of thallic oxide on single crystal gold</title><source>Elsevier ScienceDirect Journals</source><creator>Vertegel, Alexey A ; Shumsky, Mark G ; Switzer, Jay A</creator><creatorcontrib>Vertegel, Alexey A ; Shumsky, Mark G ; Switzer, Jay A</creatorcontrib><description>Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl 2O 3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.</description><identifier>ISSN: 0013-4686</identifier><identifier>EISSN: 1873-3859</identifier><identifier>DOI: 10.1016/S0013-4686(00)00427-8</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><subject>Electrodeposition ; Epitaxy ; Single crystal ; Thallic oxide</subject><ispartof>Electrochimica acta, 2000-06, Vol.45 (20), p.3233-3239</ispartof><rights>2000 Elsevier Science Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c338t-a8786b1e8c056da53a4907d98c8570da134f0f8b444e69bd0e376673df7b553d3</citedby><cites>FETCH-LOGICAL-c338t-a8786b1e8c056da53a4907d98c8570da134f0f8b444e69bd0e376673df7b553d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0013-4686(00)00427-8$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids></links><search><creatorcontrib>Vertegel, Alexey A</creatorcontrib><creatorcontrib>Shumsky, Mark G</creatorcontrib><creatorcontrib>Switzer, Jay A</creatorcontrib><title>Epitaxial electrodeposition of thallic oxide on single crystal gold</title><title>Electrochimica acta</title><description>Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl 2O 3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.</description><subject>Electrodeposition</subject><subject>Epitaxy</subject><subject>Single crystal</subject><subject>Thallic oxide</subject><issn>0013-4686</issn><issn>1873-3859</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LAzEURYMoWKs_QZiV6GL0pZlJ0pVIqR9QcKGuQyZ5UyPpZExGaf-9aStuXT143HPhHkLOKVxToPzmBYCysuKSXwJcAVQTUcoDMqJSsJLJenpIRn-RY3KS0gcACC5gRGbz3g167bQv0KMZYrDYh-QGF7oitMXwrr13pghrZ7HIv-S6pcfCxE0aMrQM3p6So1b7hGe_d0ze7uevs8dy8fzwNLtblIYxOZRaCskbitJAza2uma6mIOxUGlkLsJqyqoVWNlVVIZ82FpAJzgWzrWjqmlk2Jhf73j6Gzy9Mg1q5ZNB73WH4Smoi8r68NwfrfdDEkFLEVvXRrXTcKApqq0ztlKmtDwWgdsqUzNztnsO84tthVMk47AxaF7MbZYP7p-EHr9hzKg</recordid><startdate>20000601</startdate><enddate>20000601</enddate><creator>Vertegel, Alexey A</creator><creator>Shumsky, Mark G</creator><creator>Switzer, Jay A</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20000601</creationdate><title>Epitaxial electrodeposition of thallic oxide on single crystal gold</title><author>Vertegel, Alexey A ; Shumsky, Mark G ; Switzer, Jay A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c338t-a8786b1e8c056da53a4907d98c8570da134f0f8b444e69bd0e376673df7b553d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Electrodeposition</topic><topic>Epitaxy</topic><topic>Single crystal</topic><topic>Thallic oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Vertegel, Alexey A</creatorcontrib><creatorcontrib>Shumsky, Mark G</creatorcontrib><creatorcontrib>Switzer, Jay A</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Electrochimica acta</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Vertegel, Alexey A</au><au>Shumsky, Mark G</au><au>Switzer, Jay A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial electrodeposition of thallic oxide on single crystal gold</atitle><jtitle>Electrochimica acta</jtitle><date>2000-06-01</date><risdate>2000</risdate><volume>45</volume><issue>20</issue><spage>3233</spage><epage>3239</epage><pages>3233-3239</pages><issn>0013-4686</issn><eissn>1873-3859</eissn><abstract>Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl 2O 3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/S0013-4686(00)00427-8</doi><tpages>7</tpages></addata></record>
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subjects Electrodeposition
Epitaxy
Single crystal
Thallic oxide
title Epitaxial electrodeposition of thallic oxide on single crystal gold
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T16%3A46%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Epitaxial%20electrodeposition%20of%20thallic%20oxide%20on%20single%20crystal%20gold&rft.jtitle=Electrochimica%20acta&rft.au=Vertegel,%20Alexey%20A&rft.date=2000-06-01&rft.volume=45&rft.issue=20&rft.spage=3233&rft.epage=3239&rft.pages=3233-3239&rft.issn=0013-4686&rft.eissn=1873-3859&rft_id=info:doi/10.1016/S0013-4686(00)00427-8&rft_dat=%3Cproquest_cross%3E27686385%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27686385&rft_id=info:pmid/&rft_els_id=S0013468600004278&rfr_iscdi=true