Epitaxial electrodeposition of thallic oxide on single crystal gold

Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on...

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Veröffentlicht in:Electrochimica acta 2000-06, Vol.45 (20), p.3233-3239
Hauptverfasser: Vertegel, Alexey A, Shumsky, Mark G, Switzer, Jay A
Format: Artikel
Sprache:eng
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Zusammenfassung:Thin films of thallic oxide Tl 2O 3 (Ia3, a=1.0534 nm) were electrodeposited on the three low-index surfaces of single crystal Au (Fm3m, a=0.4079 nm). Epitaxial films of Tl 2O 3 with a strong out-of-plane (100) texture were obtained in the case of the (100) and (111) Au substrates, while the film on the (110) Au substrate did not show a preferred out-of-plane orientation. Studies of the in-plane orientation of the films revealed that the large lattice mismatch between Au and Tl 2O 3 is accommodated by the formation of the coincidence lattices on (100) and (111) Au.
ISSN:0013-4686
1873-3859
DOI:10.1016/S0013-4686(00)00427-8