Epitaxial growth at PZT/Ir interface

Surface oxidation of an iridium film and the possibility of epitaxial growth of PZT spin-coated film on sputtered iridium were investigated. The free surface on the iridium film oxidized over 400 °C with random orientation. Nevertheless, both the PZT(111)/Ir(111) and PZT(100)/Ir(100) interfaces were...

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Veröffentlicht in:Journal of materials research 2000-12, Vol.15 (12), p.2667-2671
Hauptverfasser: Okuwada, Kumi, Yoshida, Ken-ichi, Saitou, Tomoko, Sawabe, Atsuhito
Format: Artikel
Sprache:eng
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Zusammenfassung:Surface oxidation of an iridium film and the possibility of epitaxial growth of PZT spin-coated film on sputtered iridium were investigated. The free surface on the iridium film oxidized over 400 °C with random orientation. Nevertheless, both the PZT(111)/Ir(111) and PZT(100)/Ir(100) interfaces were realized using the highly oriented iridium layer. These results suggest that PZT nucleation has priority over iridium surface oxidation.
ISSN:0884-2914
2044-5326
DOI:10.1557/JMR.2000.0383