PREPARATION OF Pb(Zr, Ti)O3 THIN FILMS ON GLASS SUBSTRATES
Lead-zirconate-titanate (PZT) thin films were prepared on nonalkaline glass substrates widely used in liquid crystal display (LCD) devices by plasma-assisted magnetron RF sputtering with an immersed coil. After preparation of the PZT thin film, the glass was available for use in LCD device processin...
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Veröffentlicht in: | Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 9B, pp. 5408-5412. 2000 Part 1. Vol. 39, no. 9B, pp. 5408-5412. 2000, 2000, Vol.39 (9B), p.5408-5412 |
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Sprache: | eng |
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Zusammenfassung: | Lead-zirconate-titanate (PZT) thin films were prepared on nonalkaline glass substrates widely used in liquid crystal display (LCD) devices by plasma-assisted magnetron RF sputtering with an immersed coil. After preparation of the PZT thin film, the glass was available for use in LCD device processing. No mutual diffusion of the elements was recognized between the glass substrate and the bottom electrode. The PZT layer had a dense film structure with rectangular and columnar grains, and only its perovskite phase was crystalline. PZT thin films on a glass substrate had leakage current densities of about 10-8 A/cm2, acceptable hysteresis loop shapes with the remanent polarization (Pr) of 45 mu C/cm2 and the coercive field (Ec) of 90 kV/cm. Ferroelectric properties on a glass substrate almost conform with those on a Si-based substrate. 21 refs. |
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ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.39.5408 |