A New Scanning Probe Lithography Scheme with a Novel Metal Resist

A scanning probe lithography method based on a novel molybdenum thin film resist is presented. The lithography technique takes advantage of the highly selective etching of a metal oxide, MoO3, by water, which makes the lithographic process simple, reliable, and compatible with biological systems. Th...

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Veröffentlicht in:	Advanced materials (Weinheim) 2002-02, Vol.14 (3), p.191-194
Hauptverfasser:	Rolandi, M., Quate, C.F., Dai, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Lithography scanning probe Microscopy atomic force (AFM) Molybdenum Resists metal
Online-Zugang:	Volltext
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