A New Scanning Probe Lithography Scheme with a Novel Metal Resist

A scanning probe lithography method based on a novel molybdenum thin film resist is presented. The lithography technique takes advantage of the highly selective etching of a metal oxide, MoO3, by water, which makes the lithographic process simple, reliable, and compatible with biological systems. Th...

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Veröffentlicht in:	Advanced materials (Weinheim) 2002-02, Vol.14 (3), p.191-194
Hauptverfasser:	Rolandi, M., Quate, C.F., Dai, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Lithography scanning probe Microscopy atomic force (AFM) Molybdenum Resists metal
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	A scanning probe lithography method based on a novel molybdenum thin film resist is presented. The lithography technique takes advantage of the highly selective etching of a metal oxide, MoO3, by water, which makes the lithographic process simple, reliable, and compatible with biological systems. The method can be used to fabricate metal nanowires on insulating substrates. The Figure shows 35 nm wide Ti lines formed on a SiO2 substrate.
ISSN:	0935-9648 1521-4095
DOI:	10.1002/1521-4095(20020205)14:3<191::AID-ADMA191>3.0.CO;2-7