Influence of melt convection on the interface during Czochralski crystal growth

During the growth process of single bulk crystals from melt, the defect density is strongly affected by the shape of the melt/crystal interface. The shape of the interface is governed by the construction of the growth equipment including the heating system and the convection in the melt. In this pap...

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Veröffentlicht in:Solid-state electronics 2000-05, Vol.44 (5), p.825-830
Hauptverfasser: Miller, W., Rehse, U., Böttcher, K.
Format: Artikel
Sprache:eng
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Zusammenfassung:During the growth process of single bulk crystals from melt, the defect density is strongly affected by the shape of the melt/crystal interface. The shape of the interface is governed by the construction of the growth equipment including the heating system and the convection in the melt. In this paper the flow in a GaAs melt and the boron oxide encapsulant in an equipment used for vapour pressure controlled Czochralski growth has been calculated. 2D-axisymmetric calculations have been performed by using the commercial general purpose program FIDAP TM. A simple model has been developed to describe the phase change problem in the weak form.
ISSN:0038-1101
1879-2405
DOI:10.1016/S0038-1101(99)00280-4