Liquid-xenon-jet laser-plasma X-ray and EUV source

Liquid-xenon-jet laser-plasma X-ray and EUV source

We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range...

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Veröffentlicht in:Microelectronic engineering 2000-06, Vol.53 (1), p.667-670
Hauptverfasser: Hansson, B A M, Rymell, L, Berglund, M, Hertz, H M
Format: Artikel
Sprache:eng
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Zusammenfassung:We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.
ISSN:0167-9317
DOI:10.1016/S0167-9317(00)00401-9