Growth and structure of Cr thin films on GaAs(0 0 1)

Growth of Cr thin films on GaAs(0 0 1) was carried out using molecular beam epitaxy and was investigated by in situ reflection high-energy electron diffraction (RHEED) and ex situ X-ray diffraction (XRD). The results show that there are two competing mechanisms during the growth, and the film struct...

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Veröffentlicht in:Journal of crystal growth 2000-09, Vol.218 (2), p.197-202
Hauptverfasser: Qian, D, Liu, G.L, Loison, D, Dong, G.S, Jin, X.F
Format: Artikel
Sprache:eng
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Zusammenfassung:Growth of Cr thin films on GaAs(0 0 1) was carried out using molecular beam epitaxy and was investigated by in situ reflection high-energy electron diffraction (RHEED) and ex situ X-ray diffraction (XRD). The results show that there are two competing mechanisms during the growth, and the film structure strongly depends on the growth temperature. The single-crystalline Cr films with the body-centered-cubic (bcc) structure are obtained, with the epitaxial relationship of (0 0 1)[0 0 1] Cr∥(0 0 1)[0 0 1] GaAs and (0 0 1)[1 0 0] Cr∥(0 0 1)[1 0 0] GaAs.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(00)00545-5