The effect of the structure of ice on the aggregation state of co-adsorbed formic acid

In the present work we have investigated the effect of the structure of ice on the adsorption of formic acid on its surface. Single crystal silicon wafers (100) coated by organized organic thin films (OOTFs) were used as the substrate on top of which ice was deposited. The amount of water required t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 1998-08, Vol.327, p.499-502
Hauptverfasser: Trakhtenberg, S., Naaman, R.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In the present work we have investigated the effect of the structure of ice on the adsorption of formic acid on its surface. Single crystal silicon wafers (100) coated by organized organic thin films (OOTFs) were used as the substrate on top of which ice was deposited. The amount of water required to fully cover the surface was determined by measuring the reactivity of the OOTF with O( 3P) atomic beam as a function of ice coverage. It was found that the structure of vapor deposited formic acid is affected by the phase of the underlying ice and that the phase transition in the ice affects the infrared absorption spectrum of the formic acid.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(98)00696-8