Determination of trace impurities in high-purity aluminium oxide by high resolution inductively coupled plasma mass spectrometry

Trace impurities in high-purity aluminium oxide were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). Samples were decomposed by sulfuric acid in PTFE pressure vessels. Most of the spectral interferences could be avoided by measuring in the high resolution mode...

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Veröffentlicht in:Analytica chimica acta 1998-08, Vol.369 (1), p.79-85
Hauptverfasser: Nakane, Kiyoshi, Uwamino, Yoshinori, Morikawa, Hisashi, Tsuge, Akira, Ishizuka, Toshio
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Sprache:eng
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Zusammenfassung:Trace impurities in high-purity aluminium oxide were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). Samples were decomposed by sulfuric acid in PTFE pressure vessels. Most of the spectral interferences could be avoided by measuring in the high resolution mode (maximum mass resolution ( R), 5000). The matrix effects due to the presence of excess sulfuric acid and Al were evaluated. Since the effect of high Al concentrations on the peaks of several internal standard elements was not similar to the effect on the analyte elements, the standard addition method was employed for quantitative analysis. The detection limits in the solid samples were in the range of 0.01–4 μg g −1. Results for the determination of B, Na, Mg, Si, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Ga, Ge, Mo, Sn, Sb, Ba, La, Ce, W, Pt, Pb and U in several high-purity aluminium oxide powders were presented.
ISSN:0003-2670
1873-4324
DOI:10.1016/S0003-2670(98)00240-2