Computer simulation of multicomponent ion beam enhanced deposition of (TiMo) N films

A Monte Carlo computer simulation code has been developed to describe the behavior of incident particles and the growth of (TiMo) N films in the multicomponent ion beam enhanced deposition process, which combines bombardment with a multicomponent ion beam of N ++Mo + and sputter deposition of a Ti film. The film composition profile and intermixed layer between the substrate and the film were studied using a computer simulation method. It is shown that Mo ion implantation has a stronger mixing effect in the film–substrate interface than does N ion implantation. The N profile of the computer simulation conforms to that of the Auger electron spectroscopy results.