Characteristics of Ferroelectric Transistors with BaMgF4 Dielectric
The structure and electrical characteristics of metal‐ferroelectric‐semiconductor FET (MFSFET) for a single transistor memory are presented. The MFSFET was comprised of polysilicon islands as source/ drain electrodes and BaMgF4 film as a gate dielectric. The polysilicon source and drain were built‐u...
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Veröffentlicht in: | ETRI journal 1998-06, Vol.20 (2), p.241-249 |
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creator | Lyu, Jong‐Son Jeong, Jin‐Woo Kim, Kwang‐Ho Kim, Bo‐Woo Yoo, Hyung Joun |
description | The structure and electrical characteristics of metal‐ferroelectric‐semiconductor FET (MFSFET) for a single transistor memory are presented. The MFSFET was comprised of polysilicon islands as source/ drain electrodes and BaMgF4 film as a gate dielectric. The polysilicon source and drain were built‐up prior to the formation of the ferroelectric film to suppress a degradation of the film due to high thermal cycles. From the MFS capacitor, the remnant polarization and coercive field were measured to be about 0.6 μC/cm2 and 100 kV/cm, respectively. The fabricated MFSFETs also showed good hysteretic I ‐ V curves, while the current levels disperse probably due to film cracking or bad adhesion between the film and the Al electrode. |
doi_str_mv | 10.4218/etrij.98.0198.0208 |
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The MFSFET was comprised of polysilicon islands as source/ drain electrodes and BaMgF4 film as a gate dielectric. The polysilicon source and drain were built‐up prior to the formation of the ferroelectric film to suppress a degradation of the film due to high thermal cycles. From the MFS capacitor, the remnant polarization and coercive field were measured to be about 0.6 μC/cm2 and 100 kV/cm, respectively. The fabricated MFSFETs also showed good hysteretic I ‐ V curves, while the current levels disperse probably due to film cracking or bad adhesion between the film and the Al electrode.</description><identifier>ISSN: 1225-6463</identifier><identifier>EISSN: 2233-7326</identifier><identifier>DOI: 10.4218/etrij.98.0198.0208</identifier><language>eng</language><publisher>Taejon: Electronics and Telecommunications Research Institute</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Microelectronic fabrication (materials and surfaces technology) ; Semiconductor electronics. Microelectronics. Optoelectronics. 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The MFSFET was comprised of polysilicon islands as source/ drain electrodes and BaMgF4 film as a gate dielectric. The polysilicon source and drain were built‐up prior to the formation of the ferroelectric film to suppress a degradation of the film due to high thermal cycles. From the MFS capacitor, the remnant polarization and coercive field were measured to be about 0.6 μC/cm2 and 100 kV/cm, respectively. The fabricated MFSFETs also showed good hysteretic I ‐ V curves, while the current levels disperse probably due to film cracking or bad adhesion between the film and the Al electrode.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lyu, Jong‐Son</creatorcontrib><creatorcontrib>Jeong, Jin‐Woo</creatorcontrib><creatorcontrib>Kim, Kwang‐Ho</creatorcontrib><creatorcontrib>Kim, Bo‐Woo</creatorcontrib><creatorcontrib>Yoo, Hyung Joun</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>ETRI journal</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lyu, Jong‐Son</au><au>Jeong, Jin‐Woo</au><au>Kim, Kwang‐Ho</au><au>Kim, Bo‐Woo</au><au>Yoo, Hyung Joun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characteristics of Ferroelectric Transistors with BaMgF4 Dielectric</atitle><jtitle>ETRI journal</jtitle><date>1998-06</date><risdate>1998</risdate><volume>20</volume><issue>2</issue><spage>241</spage><epage>249</epage><pages>241-249</pages><issn>1225-6463</issn><eissn>2233-7326</eissn><abstract>The structure and electrical characteristics of metal‐ferroelectric‐semiconductor FET (MFSFET) for a single transistor memory are presented. 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subjects | Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Characteristics of Ferroelectric Transistors with BaMgF4 Dielectric |
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