Fuzzy analysis of the linear equivalent for fabricating a holographic optical element in photoresist

In this paper fuzzy analysis for economically fabricating a holographic optical element (HOE) in photoresist is conducted. We find that the grating profile has a close relationship with diffraction efficiency, and that the process parameters influence the grating profile significantly. Thus, using t...

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Veröffentlicht in:Japanese Journal of Applied Physics 1995-03, Vol.34 (3), p.1554-1561
Hauptverfasser: Seng Chang, Rong, Pio Hu, Chern Sheng Lin
Format: Artikel
Sprache:eng
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Zusammenfassung:In this paper fuzzy analysis for economically fabricating a holographic optical element (HOE) in photoresist is conducted. We find that the grating profile has a close relationship with diffraction efficiency, and that the process parameters influence the grating profile significantly. Thus, using the fuzzy control in these relations, it becomes possible to predict the diffraction efficiency and to solve many problems in the grating fabrication process. From the modulation mechanism in these complex holograms we believe we have extracted the necessary and intrinsic qualities, and our model of fuzzy set analysis produces good general agreement with the experimentally measured diffraction efficiency. The new concepts of the “linear equivalent" which we established to simplify a HOE from a honeycomb structure to a linear one will be helpful for processing various types of HOEs.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.34.1554