Structure of mullite coatings grown by chemical vapor deposition

Dense mullite coatings have been deposited on SiC and Si 3N 4 substrates by chemical vapor deposition (CVD). The coatings were compositionally graded with the Al/Si ratio increasing from 1.5 at the substrate/coating interface, to a value of 8 at the coating surface. This gradation of composition is...

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Veröffentlicht in:	Materials science & engineering. A, Structural materials : properties, microstructure and processing Structural materials : properties, microstructure and processing, 1997-07, Vol.231 (1), p.48-54
Hauptverfasser:	Doppalapudi, D, Basu, S.N
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Mullite coating Physics Structure Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Zusammenfassung:	Dense mullite coatings have been deposited on SiC and Si 3N 4 substrates by chemical vapor deposition (CVD). The coatings were compositionally graded with the Al/Si ratio increasing from 1.5 at the substrate/coating interface, to a value of 8 at the coating surface. This gradation of composition is discussed in light of changes in the concentration of oxygen vacancies, ordering of the vacancies, formation and size of domains and the observed changes in lattice parameters.
ISSN:	0921-5093 1873-4936
DOI:	10.1016/S0921-5093(97)00075-0