Crystal and domain structures in sputtered Ni-51.6 at% Ti shape memory alloy films

A new crystalline phase in sputtered Ni-51.6 at% Ti thin films crystallized at 550 deg;C for 0.5 h was discovered. Its crystal structure was determined by XRD and SAED patterns to be orthorhombic with a B-face centered cell. The lattice parameters are a = b = 4.250 Å and c = 3.005 Å and the structur...

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Veröffentlicht in:	Materials letters 1995-04, Vol.23 (1-3), p.87-91
Hauptverfasser:	Gong, F.F., Shen, G.J., Shen, H.M., Wang, Y.N.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Zusammenfassung:	A new crystalline phase in sputtered Ni-51.6 at% Ti thin films crystallized at 550 deg;C for 0.5 h was discovered. Its crystal structure was determined by XRD and SAED patterns to be orthorhombic with a B-face centered cell. The lattice parameters are a = b = 4.250 Å and c = 3.005 Å and the structure belongs to space group Bmmm (D2n19). Its 90 ° domain structure was also established.
ISSN:	0167-577X 1873-4979
DOI:	10.1016/0167-577X(95)00014-3