Intrinsic properties of NiSi
NiSi is a promising material for applications in Si microelectronics. A good understanding of its fundamental physical properties is, however, necessary in order to obtain the best use possible. We present here resistivity, Hall effect and low-temperature specific heat of high quality single crystal...
Gespeichert in:
Veröffentlicht in: | Journal of alloys and compounds 1997-11, Vol.262, p.235-237 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | NiSi is a promising material for applications in Si microelectronics. A good understanding of its fundamental physical properties is, however, necessary in order to obtain the best use possible. We present here resistivity, Hall effect and low-temperature specific heat of high quality single crystals. The resistivity of NiSi follows a classical metallic behaviour with a room temperature resistivity of ∼ 10 μΩ cm. The Hall coefficient at 300 K is approx. − 1.0 × 10
−10 m
3 C
−1, changes sign at around 40 K and becomes positive: + 0.5 × 10
−10 m
3 C
−1 at 4.2 K. Specific heat shows a classical metallic behaviour, i.e. it follows a γ
T + β
T
3 law with γ = 1.73 mJ mol
−1
K
−2 and β = 0.0317 mJ mol
−1
K
−4. It also exhibits an anomaly likely of magnetic origin at the lowest temperatures. |
---|---|
ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/S0925-8388(97)00388-5 |