Correlation of magnetic and microstructural properties of obliquely deposited Co/Cr thin films

Single layers of Si(111)/Co(200 Å)/Ag(30 Å) and trilayers of Si(111)/Co(200 Å)/Cr(15 Å)/Co(200 Å)/Ag(30 Å) were deposited, using e-beam evaporation, at oblique angles of incidence to the sample normal (in particular 0°, 25°, 40°, 70°). The magnetic properties of the samples were studied using the technique of ferromagnetic resonance, while the microstructure was imaged using high resolution electron microscopy. We find that the angle of deposition of Co has a critical effect on the magnetic anisotropy of the samples, and on the interlayer coupling strength between the ferromagnetic layers of the trilayer samples. It is shown that these effects are due to the microstructure of the samples which is controlled by the angle of Co deposition with respect to the sample normal.