Chemical fluid deposition: a hybrid technique for low-temeprature metallization

Metal deposition from supercritical CO sub 2 combines the advantages of chemical vapor deposition and aqueous plating without the drawbacks of high temperatures and toxic by-products. This general technique exploits the near- liquid densities and gas-like transport properties of the fluid, and has successfully been used to deposit bright, reflective films of Pt, Pd, Au, and Rh. Substrates include polyimide.