Oxidation and growth of Mg thin films on Ru(001)

The oxidation and growth of ultra-thin Mg films on a Ru(001) substrate have been studied using X-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) in the temperature range of 300–1500 K. Our results suggest that the growth of Mg thin films follows a layer-by-layer mode....

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Veröffentlicht in:	Surface science 1999-08, Vol.436 (1), p.167-174
Hauptverfasser:	Huang, H.H., Jiang, X., Siew, H.L., Chin, W.S., Sim, W.S., Xu, G.Q.
Format:	Artikel
Sprache:	eng
Schlagworte:	Adsorbed layers and thin films Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electron and ion emission by liquids and solids impact phenomena Exact sciences and technology Low-index single crystal surfaces Magnesium Magnesium oxides Materials science Metallic films Methods of deposition of films and coatings film growth and epitaxy Oxidation Photoemission and photoelectron spectra Physics Thermal desorption spectroscopy X-ray photoelectron spectroscopy
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Zusammenfassung:	The oxidation and growth of ultra-thin Mg films on a Ru(001) substrate have been studied using X-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) in the temperature range of 300–1500 K. Our results suggest that the growth of Mg thin films follows a layer-by-layer mode. Upon oxygen adsorption at 300 K, two O 1s peaks were detected on the Mg film. The peak at 532.2–532.6 eV could be attributed to either dioxygen or partially reduced species (O δ− , δ
ISSN:	0039-6028 1879-2758
DOI:	10.1016/S0039-6028(99)00660-3