XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate

Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C 2H 2 and a steady decrease of N 2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Surface & coatings technology 1999, Vol.120, p.618-621
Hauptverfasser:	Liuhe, Li, Lifang, Xia, Xinxin, Ma
Format:	Artikel
Sprache:	eng
Schlagworte:	Ti/TiN/Ti(N,C) multilayers Vacuum arc deposition XPS
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!