XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate
Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C 2H 2 and a steady decrease of N 2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The...
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| Veröffentlicht in: | Surface & coatings technology 1999, Vol.120, p.618-621 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
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| Online-Zugang: | Volltext |
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| Zusammenfassung: | Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C
2H
2 and a steady decrease of N
2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed. |
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| ISSN: | 0257-8972 1879-3347 |
| DOI: | 10.1016/S0257-8972(99)00426-0 |