Hybrid Electroluminescent Devices with Atomic Layer Deposited Thin Films on a Screen Printed Dielectric

A hybrid electroluminescent (EL) device structure was developed, consisting of a screen printed Pt/Ag conductor and high-k BaTiO3 dielectric, on which a phosphor, a thin insulator and a transparent conductor were deposited by atomic layer deposition (ALD). The use of the hybrid EL structure results...

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Veröffentlicht in:Japanese Journal of Applied Physics 2002, Vol.41 (Part 1, No. 9), p.5702-5705
Hauptverfasser: Stuyven, Gert, Visschere, Patrick De, Neyts, Kristiaan, Hikavyy, Andriy
Format: Artikel
Sprache:eng
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Zusammenfassung:A hybrid electroluminescent (EL) device structure was developed, consisting of a screen printed Pt/Ag conductor and high-k BaTiO3 dielectric, on which a phosphor, a thin insulator and a transparent conductor were deposited by atomic layer deposition (ALD). The use of the hybrid EL structure results in more than a doubling of brightness compared with the thin-film EL alternative structure. While hybrid EL devices with ALD-grown thin-film stack deposited directly on top of a rough dielectric yield a uniform light emission, the aging stability is determined largely by the occurrence of local breakdown events due to electric field inhomogeneities originating from the combination of the rough BaTiO3/ZnS:Mn interface and the high dielectric constant of BaTiO3. Nevertheless, lifetimes of more than 600 h at 1 kHz could be obtained. 8 refs.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.5702