Structure and adhesive properties of TiN films reactively deposited by plasma-free sputtering

TiN films with thicknesses of 2000–5600 Å, were reactively deposited on high speed tool and alloy tool steels in an atmosphere of Ar and N 2, using facing targets sputtering. The maximum deposition rate of the film was 0.26 Å/min/V, TiN(111), TiN(200), TiN(220) and TiN(311) peaks were observed from the X-ray diffraction patterns. Ti(011) and Ti 2N(202) peaks were also observed in high speed tool steels. All films deposited in this study showed a golden color. When the gas flow rate ( N 2/Ar ) and the substrate temperature were 0.5 and 480 °C, respectively, the film composition approached stoichiometry (Ti: N = 1: 1), where the lowest resistivity, and maximum tangential force of the film were 110 μΩ cm, and 10 N, respectively.