Effects of Sputtering Atmosphere Oxygen Pressure on Photocatalytic Phenomena in Anatase Films

Effects of Sputtering Atmosphere Oxygen Pressure on Photocatalytic Phenomena in Anatase Films

Thin anatase films were sputter-deposited on a glass substrate at temperatures as low as 200 C. Photocatalytic activities showed a strong dependence on O pressure during sputtering and had a close relationship with the O vacancy concentration in the films. Possible explanations for the vacancy conce...

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Veröffentlicht in:Japanese Journal of Applied Physics 2002-07, Vol.41 (Part 2, No. 7A), p.L794-L796
Hauptverfasser: Fukami, Tatsuo, Naruoka, Tomohiko, Momose, Tomoaki, Bamba, Noriko
Format: Artikel
Sprache:eng
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Zusammenfassung:Thin anatase films were sputter-deposited on a glass substrate at temperatures as low as 200 C. Photocatalytic activities showed a strong dependence on O pressure during sputtering and had a close relationship with the O vacancy concentration in the films. Possible explanations for the vacancy concentration of films and their photocatalytic activity have been discussed. 11 refs.
ISSN:0021-4922
DOI:10.1143/JJAP.41.L794